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Plasma polymerization of trimethylsilane in cascade arc discharge
Author(s) -
Lin Y.S.,
Yasuda H. K.
Publication year - 1997
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19971128)66:9<1653::aid-app4>3.0.co;2-c
Subject(s) - trimethylsilane , x ray photoelectron spectroscopy , materials science , analytical chemistry (journal) , plasma polymerization , scanning electron microscope , plasma , plasma parameters , polymer , argon , electric arc , polymerization , chemistry , composite material , chemical engineering , organic chemistry , electrode , physics , quantum mechanics , engineering
Plasma polymerization of trimethylsilane (TMS) in cascade arc discharge was experimentally investigated. It was found that the deposition rates of methane and TMS plasma polymer were dependent on plasma parameters, and the surface characteristics of plasma polymer were also dependent on plasma variables. The following plasma variables were studied: arc current, argon flow rate, TMS flow rate, chamber pressure, substrate axial, and radial positions. Carbon, silicon, and oxygen were the main elements observed in TMS polymer films obtained by x‐ray photoelectron spectroscopy (XPS). Powder‐like TMS polymer films were observed by scanning electron microscopy (SEM). The size distribution of the powder‐like particles was strongly dependent on deposition parameters. © 1997 John Wiley & Sons, Inc. J Appl Polym Sci 66: 1653–1665, 1997