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Surface coating protective against oxidative plasma etching of polypropylene
Author(s) -
Hirotsu Toshihiro,
Nugroho Pramono
Publication year - 1997
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19971107)66:6<1049::aid-app5>3.0.co;2-i
Subject(s) - etching (microfabrication) , polypropylene , hexamethyldisiloxane , plasma etching , polymer , materials science , coating , plasma , polymer chemistry , layer (electronics) , plasma polymerization , polymerization , monomer , chemical engineering , chemistry , composite material , physics , quantum mechanics , engineering
Polypropylene (PP) sheets were coated with the ultrathin polymer layers by plasma polymerization of hexamethyldisiloxane and two other Si‐containing monomers, and the protection effects from oxidative plasma etching were investigated. Etching was evaluated by the weight loss of PP sheets after the exposure to an oxidative plasma of O 2 or air. The effects of plasma polymer coating on the etching resistance were investigated with respect to the type of plasma polymer, thickness of a coating layer, oxidative plasma etching conditions, etc. Weight of the coated PP sheets was less changed and the substrates remained stable after a certain period of oxidative plasma treatments, during which time the original PP film had prominently lost weight. The importance of the crosslinked network with —Si— MPO components in plasma polymers on the etching resistance was suggested from the results. Infrared spectra were taken and analyzed with the plasma polymers after O 2 ‐plasma treatments, and the increase in the Si—O structure was indicated by the increase in the peak intensity at 1023 cm −1 . Stabilization against oxidative etching was attributed to the crosslinked Si—O structure on the surface layer. © 1997 John Wiley & Sons, Inc. J Appl Polym Sci 66: 1049–1057, 1997