Premium
Spectral sensitivity of chitosan photodegradation
Author(s) -
Andrady Anthony L.,
Torikai Ayako,
Kobatake Takahiro
Publication year - 1996
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19961128)62:9<1465::aid-app16>3.0.co;2-y
Subject(s) - photodegradation , fourier transform infrared spectroscopy , infrared , materials science , irradiation , chitosan , photochemistry , infrared spectroscopy , absorption spectroscopy , visible spectrum , absorption (acoustics) , analytical chemistry (journal) , chemistry , optics , photocatalysis , optoelectronics , organic chemistry , physics , catalysis , composite material , nuclear physics
Abstract The wavelength sensitivity of photodegradation of solvent‐cast chitosan films exposed to monochromatic UV‐visible radiation is reported. Measurements were made of changes in absorption spectra, both in the UV‐visible region and in the infrared region, as well as changes in dilute solution viscosity of samples, on irradiation at selected wavelengths. Action spectra are reported for these processes. A mechanism of photodegradation based on changes in Fourier transform infrared (FTIR) spectra of irradiated chitosan is presented. © 1996 John Wiley & Sons, Inc.