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Photosensitive microspheres for photoresists
Author(s) -
Wang S. H.,
Azuma C.
Publication year - 1996
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19961114)62:7<957::aid-app1>3.0.co;2-r
Subject(s) - copolymer , differential scanning calorimetry , polymer chemistry , irradiation , materials science , methacrylate , ultraviolet , photosensitivity , emulsion polymerization , polymerization , size exclusion chromatography , chemistry , polymer , organic chemistry , composite material , physics , optoelectronics , nuclear physics , thermodynamics , enzyme
Crosslinked copolymer microspheres of n‐butyl methacrylate (BMA) and 2‐hydroxyethl methacrylate (HEMA) having varied diameters and composition were prepared by emulsion polymerization. Photosensitive materials were obtained by reacting hydroxyl pendant groups with cinnamovl chloride. Photosensitivity and conversion curves were determined after ultraviolet irradiation for different periods of time, and were evaluated as function of composition and particle size. Minimum irradiation time for insolubilization for each product was also determined, and it has been noted that almost all of the photosensitive microspheres have shown higher performance compared to linear poly(vinyl cinnamate). Synthesized products were characterized by infrared and nuclear magnetic resonance spectroscopies, differential scanning calorimetry, size exclusion chromatography, and transmission electron microscopy. © 1996 John Wiley & Sons, Inc.