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DC plasma‐polymerization of pyrrole: Comparison of films formed on anode and cathode
Author(s) -
Eofinger S.,
van Ooij W. J.,
Ridgway T. H.
Publication year - 1996
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19960829)61:9<1503::aid-app10>3.0.co;2-r
Subject(s) - anode , cathode , x ray photoelectron spectroscopy , materials science , cyclic voltammetry , polymerization , degree of unsaturation , pyrrole , thin film , analytical chemistry (journal) , plasma polymerization , infrared spectroscopy , chemical engineering , polymer chemistry , chemistry , electrode , organic chemistry , composite material , electrochemistry , nanotechnology , polymer , engineering
Thin films of plasma‐polymerized pyrrole were deposited on stainless steel substrates from a parallel‐plate DC reactor. They were characterized by XPS, 1 H‐NMR, STM, cyclic voltammetry, and by reflection‐absorption infrared (RAIR) and UV‐VIS spectroscopy. The films simultaneously formed on the anode and the cathode were compared. Substantial differences were found between the structures of these films, although their overall compositions were very similar. The films on the anode appeared to be less crosslinked and contained less unsaturation and conjugation than the films on the cathode. The observed effects are explained in a model in which the concurrent positive ion bombardment plays an important role in modifying the structure of a growing plasma‐polymerized film. © 1996 John Wiley & Sons, Inc.