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Synthesis and properties of new copolymers containing hindered amine
Author(s) -
Pan JiangQing,
Lau Wayne W. Y.,
Zhang Z. F.,
Hu X. Z.
Publication year - 1996
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19960822)61:8<1405::aid-app22>3.0.co;2-w
Subject(s) - copolymer , monomer , polymer chemistry , styrene , methyl methacrylate , amine gas treating , epoxy , materials science , methacrylate , tertiary amine , chemistry , organic chemistry , polymer
Eight new copolymers containing hindered amine (HA) were synthesized by copolymerization of vinyl monomers [styrene (St), methyl methacrylate (MMA)] with new functional monomers produced by reaction of 4‐amino‐2,2,6,6‐tetramethylpiperidine (ATMP) and epoxy compounds containing double bond, and mixture copolymerization of vinyl monomers (St and MMA) with a mixture of ATMP and above epoxy compounds. The structure of these new copolymers were characterized by IR, NMR, and elemental analysis. The properties of these new copolymers were described and their photoprotecting effectiveness examined. Experimental results indicate that they possess high photoprotecting effectiveness comparable to or higher than that of a commercial polymeric HALS “PDS.” © 1996 John Wiley & Sons, Inc.