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UV‐Sensitive polyarylates as photolithographic emulsions
Author(s) -
iewicz Konrad,
Brzozowski Zbigniew K.,
Zadrozna Irmina
Publication year - 1996
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3
Subject(s) - dielectric , materials science , polymer , monomer , condensation polymer , polymer chemistry , electrical resistivity and conductivity , dielectric loss , chemical engineering , composite material , optoelectronics , engineering , electrical engineering
Several UV‐sensitive polyarylates based on bisbenzylidenoketones for use as potential pho‐tolithographic emulsions were obtained by interfacial polycondensation. The structures of obtained UV‐sensitive monomers and polymers were confirmed by infrared, 1 H‐NMR, and UV spectroscopies. Mechanical and dielectric properties of the obtained polyarylates (in‐cluding dielectric loss factor, dielectric constant, volume and surface resistivity, and dielectric strength) were evaluated. The investigations show that some of the new polymers obtained in this study may find application as photoresists. © 1996 John Wiley & Sons, Inc.