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Development of the activation process model: Compensation effect
Author(s) -
Stepanov A. V.,
Tavgin V. L.
Publication year - 1996
Publication title -
international journal of quantum chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.484
H-Index - 105
eISSN - 1097-461X
pISSN - 0020-7608
DOI - 10.1002/(sici)1097-461x(1996)59:1<7::aid-qua2>3.0.co;2-1
Subject(s) - arrhenius equation , excited state , chemistry , quantum , thermal diffusivity , degeneracy (biology) , thermodynamics , diffusion , activation energy , kinetic energy , statistical physics , diffusion process , atomic physics , physics , quantum mechanics , bioinformatics , knowledge management , innovation diffusion , biology , computer science
In this article, an attempt was made to develop an activation process model. The average energy of the translational motion of the atoms, taking part in the elementary activation process and being in the thermodynamic equilibrium with thermal radiation, was obtained using the quantum canonical Gibbs distribution and the model principles of elementary activation. The degeneracy and exclusion of some excited vibrational levels were taken into consideration, the result being a strong dependence of the probability of surmounting the activation barrier on the behavior of the excited vibrational states of the quantum subsystems. As an application of the development model, the formulas of the preexponential factor for solid‐state atomic diffusivity and first‐order chemical reaction rate constants were derived. Quantitative analysis of the atomic diffusion in solids in the framework of our model has made it possible to describe the diffusion processes in metals, covalent semiconductors, as well as diffusion anomalies, connected with the “nonclassical” behavior of the empirical Arrhenius dependence. A possible physical essence of a kinetic compensation effect is discussed. It was shown that compensation may be caused by only changing the degeneracy of the vibrational levels of the quantum subsystems. © 1996 John Wiley & Sons, Inc.

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