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A shock tube study of the reaction of H atoms with SiCl 4
Author(s) -
Catoire L.,
Woiki D.,
Roth P.
Publication year - 1997
Publication title -
international journal of chemical kinetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.341
H-Index - 68
eISSN - 1097-4601
pISSN - 0538-8066
DOI - 10.1002/(sici)1097-4601(1997)29:6<469::aid-kin9>3.0.co;2-s
Subject(s) - chemistry , methyl iodide , shock tube , thermal decomposition , atom (system on chip) , bar (unit) , iodide , ethyl iodide , analytical chemistry (journal) , shock wave , thermodynamics , medicinal chemistry , inorganic chemistry , organic chemistry , physics , meteorology , computer science , embedded system
The reaction of H atoms with SiCl 4 was studied behind reflected shock waves at temperatures between 1530 K and 1730 K and pressures around 1.5 bar by applying atomic resonance absorption spectroscopy (ARAS) for time resolved measurements of H atoms at the L α ‐line. The thermal decomposition of a few ppm ethyl iodide (C 2 H 5 l) was used as a H‐atom source. In the presence of a high excess of the molecular reactant SiCl 4 a slow consumption of H was observed, which follows a pseudo‐first‐order rate law. Rate coefficient for the consumption of H by the reaction: $$H+SiCl_4\,{\buildrel{k_1}\over{\longrightarrow}} SiCl_3\,+HCl \eqno(R1)$$ was determined to be: $$k_1=1.4\times 10^{13}\exp(-4800 K/T) cm^3 mol^{-1} s^{-1}.$$ © 1997 John Wiley & Sons, Inc. Int J Chem Kinet 29: 469–472, 1997.