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Waveguide Raman microspectroscopy used for local investigation of very thin films
Author(s) -
Mugnier J.,
Urlacher C.,
Plenet J. C.,
Champag B.
Publication year - 1997
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/(sici)1097-4555(199712)28:12<989::aid-jrs193>3.0.co;2-u
Subject(s) - raman spectroscopy , waveguide , raman scattering , materials science , thin film , optics , layer (electronics) , raman microspectroscopy , optoelectronics , nanotechnology , physics
This paper presents a new Raman tool for local investigations of very thin waveguiding films. This method, called waveguide Raman microspectroscopy (WRMS), combines the advantages of micro‐Raman spectroscopy (MRS) and waveguide Raman spectroscopy (WRS). Experiments were carried out on a thin TiO 2 waveguide (150 nm thick) obtained by the sol–gel process. Results obtained on the TiO 2 thin waveguide confirm the interest in this non‐destructive method, including simultaneous optical observations of the layer, local investigations, microstructural analyses and very low‐wavenumber Raman scattering investigations. Further applications of WRMS are described. © 1997 John Wiley & Sons, Ltd.