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Total reflection x‐ray photoelectron spectroscopy of a tantalum–titanium multilayer
Author(s) -
Kawai Jun,
Sai Makoto,
Sugimura Tetsuro,
Hayashi Kouichi,
Takenaka Hisataka,
Kitajima Yoshinori
Publication year - 1999
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/(sici)1097-4539(199911/12)28:6<519::aid-xrs395>3.0.co;2-w
Subject(s) - x ray photoelectron spectroscopy , photoelectric effect , beamline , synchrotron radiation , tantalum , materials science , titanium , x ray , spectral line , wafer , reflection (computer programming) , atomic physics , analytical chemistry (journal) , optics , chemistry , physics , nuclear magnetic resonance , optoelectronics , beam (structure) , chromatography , astronomy , computer science , metallurgy , programming language
Abstract X‐ray photoelectron spectra of two Ta–Ti bilayers on a Si wafer are measured using a soft x‐ray synchrotron radiation beamline at the Photon Factory. The grazing incident x‐rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x‐rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample. Copyright © 1999 John Wiley & Sons, Ltd.