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A semi‐empirical derivation of thin‐film sensitivities for EDXRF spectrometers
Author(s) -
Kellogg Robert B.
Publication year - 1999
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/(sici)1097-4539(199909/10)28:5<406::aid-xrs376>3.0.co;2-q
Subject(s) - spectrometer , calibration , fortran , monochromatic color , detector , excitation , sensitivity (control systems) , silicon , polynomial , line (geometry) , optics , materials science , computer science , physics , optoelectronics , mathematics , electronic engineering , engineering , geometry , mathematical analysis , quantum mechanics , operating system
A semi‐empirical calibration method for single‐layer thin films is described which is based on measured standards and cross‐sections generated by the National Institute of Standards and Technology database XGAM. A Fortran program, XRFCAL, fits the ratio of measured sensitivity to the relative excitation and detection efficiency to a second‐order polynomial in atomic number. The approach is intended not only to provide sensitivities for elements that have no reliable standards but also to improve on the calibration for elements that do. It is applicable only to K‐line radiation and silicon detector energy‐dispersive XRF spectrometers with secondary or monochromatic excitation. Copyright © 1999 John Wiley & Sons, Ltd.