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Continuous Fluorescence Correction in Electron Probe Microanalysis Applying an Electron Scattering Model
Author(s) -
Pfeiffer Arnold,
Schiebl Christian,
Wernisch Johann
Publication year - 1996
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/(sici)1097-4539(199605)25:3<131::aid-xrs150>3.0.co;2-0
Subject(s) - bremsstrahlung , electron microprobe , electron , electron probe microanalysis , fluorescence , absorption (acoustics) , analytical chemistry (journal) , atomic physics , microanalysis , field (mathematics) , scattering , chemistry , computational physics , physics , materials science , optics , mineralogy , nuclear physics , mathematics , organic chemistry , chromatography , pure mathematics
A derivation of the continuous fluorescence correction factor for use in electron probe microanalysis (EPMA) is presented. The exciting bremsstrahlung is described by using a continuous depth distribution function Φ cont (ρ z ) analogous to Φ(ρ z ) models describing the generation of characteristic x‐radiation by primary electrons. Therefore, no simplifications and approximations depending on the generation depth and absorption length of the secondarily excited characteristic x‐radiation have to be made. The introduced model is applicable to bulk and layered samples. Calculations of the continuous fluorescence correction factor were made for K, L and M lines of pure element standards. The influence of continuous fluorescence in the field of EPMA, especially concerning the methods of film thickness determination, is shown by examples of calculations on film–substrate samples.