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Mass spectrometry as an ancillary tool in metallo‐organic chemical vapour deposition studies
Author(s) -
Carta Giovanni,
Rossetto Gilberto,
Borella Linda,
Favretto Donata,
Traldi Pietro
Publication year - 1997
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/(sici)1097-0231(199708)11:12<1315::aid-rcm964>3.0.co;2-i
Subject(s) - chemistry , platinum , electrospray ionization , mass spectrometry , chemical vapor deposition , decomposition , metalorganic vapour phase epitaxy , analytical chemistry (journal) , ionization , inorganic chemistry , organic chemistry , chromatography , ion , epitaxy , catalysis , layer (electronics)
Mass spectrometry has been employed as a diagnostic tool to investigate the decomposition of the (methylcyclopentadienyl)allyl–platinum complexes used as precursors for metallo‐organic chemical vapour deposition (MOCVD) of platinum film. Measurements were performed either under electron ionization or electrospray ionization conditions. Both techniques indicate the Pt–allyl bond as being the weakest and the high stability of the Pt–methylcyclopentadienyl cation. Under electrospray conditions easy formation of platinum clusters is observed; most of them still contain one or more methylcyclopentadienyl species, thus giving a possible explanation of the undesired carbon‐containing species sometimes present in the MOCVD‐generated platinum film. © 1997 John Wiley & Sons, Ltd.