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Development of Laser‐induced Vaporization Mass Spectrometry to Study Refractory Materials
Author(s) -
Joseph M.,
Sivakumar N.,
Darwin Albert Raj D.,
Matthews C. K.
Publication year - 1996
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/(sici)1097-0231(19960115)10:1<5::aid-rcm424>3.0.co;2-e
Subject(s) - vaporization , chemistry , refractory (planetary science) , mass spectrometry , vapor pressure , partial pressure , analytical chemistry (journal) , refractory metals , laser , vapour density , environmental chemistry , chromatography , metallurgy , organic chemistry , optics , materials science , physics , oxygen
An experimental facility has been developed based on laser‐induced vaporization of materials, coupled with mass spectrometric monitoring of the vapour species. The primary purpose is to measure the vapour pressures of refractory materials in the temperature range 2500–5000 K. The results obtained on the partial pressures of various U–O vapour species are presented. The total vapour pressure at 4300 K is deduced to be 3.9 atmospheres.