Premium
Main‐chain photosensitive polyamic acids using alkaline aqueous solution as developer
Author(s) -
Hou Haoqing,
Yang Zhenghua,
Ding Mengxian
Publication year - 1999
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/(sici)1097-0126(199905)48:5<421::aid-pi153>3.0.co;2-5
Subject(s) - aqueous solution , polymer , thermal stability , diamine , conjugated system , materials science , chemical engineering , polymer chemistry , side chain , chemistry , organic chemistry , engineering
In order to develop photosensitive polyimides (PSPIs) imaged in alkaline aqueous solution, a photosensitive diamine and relevant polymer containing conjugated double bonds in the main chain have been synthesized. The photosensitive characteristics and thermal stability of the polymers were investigated. These polymers possess good thermal stability and sensitivity to UV irradiation, and could be used to form a PSPI resist using alkaline aqueous solution as developer. © 1999 Society of Chemical Industry