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Preparation for TEM of layered samples with fragile microstructure and weak layer interface
Author(s) -
Westman A.K.,
Wei L.Y.,
Barre F.
Publication year - 1999
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/(sici)1097-0029(19990501)45:3<198::aid-jemt7>3.0.co;2-e
Subject(s) - materials science , microstructure , polishing , transmission electron microscopy , borosilicate glass , focused ion beam , sample preparation , composite material , boron nitride , layer (electronics) , grinding , silicon nitride , ion milling machine , aluminium , titanium , metallurgy , nanotechnology , ion , chemistry , chromatography , organic chemistry
The objective of this work was to prepare for transmission electron microscopy (TEM) a layered structure of materials with fragile microstructure. The samples consisted of two layers of different materials, silicon nitride and borosilicate glass, loosely bonded together. The low strength of the sample resulted in fragmentation during more conventional preparation. However, it was possible to prepare the fragments by mounting them in a titanium specimen carrier with aluminium strips as support. After grinding and polishing, a technique of low‐angle ion milling was used to obtain electron beam transparent areas at the nitride/glass interface. Microsc. Res. Tech. 45:198–202, 1999. © 1999 Wiley‐Liss, Inc.