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Characterization of titanium hydride films covered by nanoscale evaporated Au layers: ToF‐SIMS, XPS and AES depth profile analysis
Author(s) -
Lisowski W.,
van den Berg A. H. J.,
Leonard D.,
Mathieu H. J.
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(200004)29:4<292::aid-sia863>3.0.co;2-l
Subject(s) - x ray photoelectron spectroscopy , secondary ion mass spectrometry , sputtering , analytical chemistry (journal) , titanium , materials science , auger , layer (electronics) , hydride , thin film , substrate (aquarium) , hydrogen , chemistry , mass spectrometry , nanotechnology , metal , chemical engineering , metallurgy , physics , oceanography , chromatography , atomic physics , geology , engineering , organic chemistry
Thin titanium hydride (TiH y ) films, covered by ultrathin gold layers, have been compared with the corresponding titanium films after analysis using a combination of time‐of‐flight SIMS (ToF‐SIMS), XPS and AES. The TiH y layers were prepared under UHV conditions by precisely controlled hydrogen sorption at 298 K on Ti film evaporated onto a glass substrate. Both Ti and TiH y films were then covered in situ by a nanoscale Au layer. Analyses were performed in separate systems after long‐term exposure of the films to air. The thin gold layers covering the Ti and TiH y surfaces prevent any extensive air interaction with both films, allowing characterization of the bulk Ti and TiH y layers ex situ , even after a long‐term application in air. The chemical nature of the TiH y layers has been analysed after sputtering of the Au top layer. The high‐mass‐resolution positive‐ion ToF‐SIMS spectra disclosed only one peak at mass 49 ( 49 Ti + ) for the Ti and two peaks at mass 49 ( 49 Ti + and 48 TiH + ) for the TiH y film, reflecting a difference in hydrogen concentration. Analysis of the features of the Ti Auger spectra during the sputter profile measurements allows the TiH y to be distinguished and characterized in the bulk region of the Au/TiH y layer. Besides TiH y , TiO and TiOH were detected by XPS to be the main chemical compounds in the interface region of the Au/TiH y film. Copyright © 2000 John Wiley & Sons, Ltd.