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Effect of process parameters on the optical constants of thin metal films
Author(s) -
Tompkins Harland G.,
Baker Jeffrey H.,
Convey Diana
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(200003)29:3<227::aid-sia730>3.0.co;2-w
Subject(s) - argon , thin film , molar absorptivity , chromium , extinction (optical mineralogy) , sputtering , metal , conductivity , substrate (aquarium) , materials science , chemistry , deposition (geology) , analytical chemistry (journal) , optics , mineralogy , metallurgy , nanotechnology , physics , paleontology , oceanography , organic chemistry , chromatography , sediment , geology , biology
In this study, we show that the optical constants of sputter‐deposited chromium depend on the argon pressure used for the deposition. Higher argon pressure gives lower extinction coefficients. Sheet resistance measurements show that those materials with lower extinction coefficients also have lower conductivity. Whereas the argon pressure strongly affects the resulting optical constants of the film material, the choice of substrate material does not affect the resulting optical constants of the film. Copyright © 2000 John Wiley & Sons, Ltd.