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GDOES depth profiling analysis of a thin surface film on aluminium
Author(s) -
Shimizu K.,
Habazaki H.,
Skeldon P.,
Thompson G. E.,
Wood G. C.
Publication year - 1999
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199911)27:11<998::aid-sia667>3.0.co;2-1
Subject(s) - electropolishing , aluminium , impurity , materials science , copper , metallurgy , thin film , chromium , analytical chemistry (journal) , metal , layer (electronics) , chemistry , composite material , nanotechnology , electrode , organic chemistry , electrolyte , chromatography
Analysis of a surface film ∼4 nm thick formed on electropolished, high‐purity aluminium given a post‐electropolishing treatment in a hot CrO 3 –H 3 PO 4 solution demonstrates the suitability of glow discharge optical emission spectroscopy for in‐depth analysis of very thin films. Thus, the distributions of impurity species, namely chromium, hydrogen and phosphorus species, in the film are revealed, with excellent depth resolution. Further, copper enrichment in a thin layer a few nanometres thick in the metal immediately beneath the surface film, resulting from initial oxidation of aluminium during electropolishing, is revealed. Copyright © 1999 John Wiley & Sons, Ltd.