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Study of low energy high dose nitrogen implantation in aluminium, iron, copper and gold
Author(s) -
Sanghera H. K.,
Sullivan J. L.
Publication year - 1999
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199907)27:7<678::aid-sia562>3.0.co;2-v
Subject(s) - x ray photoelectron spectroscopy , copper , aluminium , nitrogen , ion , ion implantation , chemistry , chemical state , chemical composition , metallurgy , analytical chemistry (journal) , inorganic chemistry , materials science , environmental chemistry , chemical engineering , engineering , organic chemistry
Abstract To advance the understanding of fundamental physical and chemicalprocesses occurring in ion bombardment of metals, ion beamnitridation of aluminium, iron, copper and gold is studied in theenergy range 2–5 keV, at current densities of 1 and 5 μA cm −2 , for each ion energy. The concentration profilesof nitrogen‐ion‐implanted metals were measured byx‐ray photoelectron spectroscopy (XPS). The chemicalcomposition and chemical structure of the implanted metals were alsoinvestigated. Copyright © 1999 John Wiley & Sons, Ltd.