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Structure and physicochemistry of anodic oxide films on titanium and TA6V alloy
Author(s) -
Zwilling V.,
DarqueCeretti E.,
BoutryForveille A.,
David D.,
Perrin M. Y.,
Aucouturier M.
Publication year - 1999
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199907)27:7<629::aid-sia551>3.0.co;2-0
Subject(s) - anodizing , x ray photoelectron spectroscopy , titanium , chemical engineering , materials science , secondary ion mass spectrometry , scanning electron microscope , amorphous solid , dissolution , hydrofluoric acid , nanoporous , oxide , analytical chemistry (journal) , aluminium , metallurgy , chemistry , crystallography , nanotechnology , mass spectrometry , composite material , engineering , chromatography
Anodization of titanium and its alloys is an important surfacetreatment, especially for adhesion applications, but is not as wellstudied as for aluminium alloys. This paper deals with themorphological, structural and physicochemical characterization ofanodic oxide films grown on titanium and Ti–6Al–4V(TA6V) in chromic acid solution without (CA) orwith (CA/HF) hydrofluoric acid addition. Severalinvestigations methods are used: high‐resolution scanningelectron microscopy (HR‐SEM), reflectionhigh‐energy electron diffraction (RHEED),x‐ray photoelectron spectroscopy (XPS), secondaryion mass spectrometry (SIMS), nuclear reaction analysis(NRA) and wetting angle measurements. The occurrence andmorphology of the nanoporous structure for CA/HF anodization aredescribed. The compact films grown in CA solution are amorphous andthe porous films grown in the CA/HF solution are partiallycrystalline. The thickness and morphology of the films are describedand discussed as a function of the anodizing conditions and of thecomposition of the underlying substrate. The composition of the filmappears to be TiO 2 +Al 2 O 3 (with Ti/Al atomic ratio ∽5), with incorporationof fluorine from the solution in the porous films and of smallquantities of vanadium in the films that are grown. The specific roleplayed by the Cr(VI) and F species on the filmgrowth‐and‐dissolution formation process is discussedand a growth mechanism is proposed. Copyright © 1999 John Wiley& Sons, Ltd.