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Surface functionalization of PEEK films studied by time‐of‐flight secondary ion mass spectrometry and x‐ray photoelectron spectroscopy
Author(s) -
HenneuseBoxus Catherine,
Poleunis Claude,
De Ro Astrid,
Adriaensen Yasmine,
Bertrand Patrick,
MarchandBrynaert Jacqueline
Publication year - 1999
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199903)27:3<142::aid-sia493>3.0.co;2-6
Subject(s) - peek , x ray photoelectron spectroscopy , surface modification , chemistry , amine gas treating , ether , secondary ion mass spectrometry , mass spectrometry , polymer chemistry , yield (engineering) , aryl , polyether ether ketone , ion , analytical chemistry (journal) , organic chemistry , chemical engineering , materials science , chromatography , composite material , polymer , alkyl , engineering
Abstract Using the wet chemistry method, the surface of poly(aryl etherether ketone) (PEEK) film was selectively modified toproduce PEEK‐OH, PEEK‐COOH, PEEK‐glutamine,PEEK‐NH 2 and PEEK‐SO 3 H samplesdisplaying, respectively, hydroxyl, carboxyl, amino acid, amine andsulphonyl functions. All the samples were analysed by XPS andtime‐of‐flight (ToF) SIMS; the experimentaldata provided by both techniques were in good agreement, and allowedthe chemical nature and the yield of the functional groups introducedby the different surface derivatizations to be determined. Copyright© 1999 John Wiley & Sons, Ltd.