Premium
Degradation of poly(vinyl alcohol) thin films during monochromatized XPS: substrate effects and x‐ray intensity dependence
Author(s) -
Beamson G.,
Briggs D.
Publication year - 1998
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(19980501)26:5<343::aid-sia377>3.0.co;2-m
Subject(s) - x ray photoelectron spectroscopy , photoelectric effect , x ray , substrate (aquarium) , vinyl alcohol , silicon , chemistry , yield (engineering) , degradation (telecommunications) , analytical chemistry (journal) , copper , thin film , materials science , optics , chemical engineering , nanotechnology , organic chemistry , optoelectronics , composite material , polymer , physics , telecommunications , oceanography , computer science , engineering , geology
Films of poly(vinyl alcohol), ∽2 nm thick, on silicon, copper and gold substrates were allowed to degrade for up to 800 min during monochromatized Al Kα XPS. Relative initial degradation rates of 1:∽33:∽41 were measured for the three substrates, consistent with their yield of photoelectrons and secondary electrons. The initial rate of degradation was found to vary linearly with the x‐ray intensity. © 1998 John Wiley & Sons, Ltd.