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Effect of RCA cleaning on the surface chemistry of glass and polysilicon films as studied by ToF‐SIMS and XPS
Author(s) -
Onyiriuka E. C.,
Moore C. B.,
Fehlner F. P.,
Binkowski N. J.,
Salamida D.,
King TJ.,
Couillard J. G.
Publication year - 1998
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199804)26:4<270::aid-sia371>3.0.co;2-h
Subject(s) - x ray photoelectron spectroscopy , hydrofluoric acid , etching (microfabrication) , contact angle , isotropic etching , silica glass , chemistry , alkaline earth metal , chemical engineering , mineralogy , materials science , analytical chemistry (journal) , inorganic chemistry , alkali metal , nanotechnology , composite material , environmental chemistry , organic chemistry , layer (electronics) , engineering
The surface chemistry of an alkaline‐earth boroaluminosilicate glass is changed by contact with chemical solutions. The present study shows that RCA cleaning creates a silica‐rich surface on the glass. This altered surface can be removed by hydrofluoric acid etching. During the RCA cleaning process, glass components can be transferred to a polysilicon film placed in the same alkaline solution. The acidic solution in turn removes most of the contamination from the polysilicon. © 1998 John Wiley & Sons, Ltd.