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Sims image analysis of D 2 O migration in ZrO 2 thin films
Author(s) -
Clarke A. H.,
McIntyre N. S.
Publication year - 1997
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199711)25:12<948::aid-sia338>3.0.co;2-k
Subject(s) - oxide , alloy , grain boundary , materials science , secondary ion mass spectrometry , porosity , niobium , diffusion , zirconium alloy , niobium oxide , analytical chemistry (journal) , metallurgy , ion , chemical engineering , chemistry , composite material , microstructure , physics , organic chemistry , chromatography , thermodynamics , engineering
The diffusion of D 2 O into and through oxide films on ZrNb alloys was investigated using secondary ion mass spectrometry (SIMS) image analysis. In preparation for this, the microscopic structures of the oxide were studied in relation to the grain structures in the underlying alloy. On alloys containing low concentrations of niobium (1–2.5 wt.%), the oxide was found to exhibit more localized growth, particularly above grain boundaries in the alloy. Such oxide regions appeared to be considerably more porous to D 2 O ingress. By contrast, the oxide film on the Zr 20 wt.% Nb alloy was found to be the most resistant to D 2 O ingress; no local regions of higher porosity could be found. © 1997 John Wiley & Sons, Ltd.