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Charging Phenomena and Charge Compensation in AES on Metal Oxides and Silica
Author(s) -
Guo Hansheng,
MausFriedrichs W.,
Kempter V.
Publication year - 1997
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199706)25:6<390::aid-sia247>3.0.co;2-x
Subject(s) - auger electron spectroscopy , torr , analytical chemistry (journal) , chemistry , auger , atomic physics , irradiation , cathode ray , spectroscopy , electron , physics , chromatography , quantum mechanics , nuclear physics , thermodynamics
Charging processes on the bulk oxides Al 2 O 3 , ZrO 2 and SiO 2 occurring during Auger Electron Spectroscopy (AES) are studied. All samples experience a negative charge‐up under the following parameters: electron beam energy >1 keV, current density >10 ‐2 A cm ‐2 and different angles of incidence. The samples show strong history effects as a function of previous irradiation damage. For charge compensation, Environmental Auger Electron Spectroscopy with O 2 gas is applied; several traditional methods were applied for comparison. Charging of SiO 2 and ZrO 2 could be reduced considerably in an O 2 environmental pressure of <5×10 ‐8 Torr. Charging of Al 2 O 3 could be compensated completely in this oxygen environment. It is shown that for the compensation of the electron beam effects, including electron‐stimulated desorption and carbon contamination of the surface, an O 2 atmosphere of 5×10 ‐8 Torr is more efficient than using an auxiliary electron gun or low‐energy positive ions. It is also more efficient than an Ar environment of 1×10 ‐4 Torr. © 1997 John Wiley & Sons, Ltd.