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Atomic Force Microscopy Investigation of Noble Gas Ion Bombardment on InP: Effect of Ion Energy
Author(s) -
Demanet C. M.,
Vijaya Sankar K.,
Malherbe J. B.,
van der Berg N. G.,
Odendaal R. Q.
Publication year - 1996
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199608)24:8<497::aid-sia143>3.0.co;2-k
Subject(s) - ion , neon , krypton , argon , atomic physics , analytical chemistry (journal) , ion implantation , chemistry , materials science , physics , organic chemistry , chromatography
Mirror‐polished InP(100) samples, n‐doped with S atoms to 4×10 18 cm −3 , were bombarded with neon, argon and krypton ions. The energy of the ions was varied from 0.5–5 keV at a constant angle of incidence at 41° with respect to the sample normal. The ion dose density for Ne + was 1.8×10 16 ions cm −2 and for Ar + and Kr + was 5×10 16 ions cm −2 . A low ion current density of 5×10 13 ions cm −2 s −1 was used to minimize sample heating. The resulting topography development was investigated by atomic force microscopy (AFM). The topography development was quantified in terms of RMS (root‐mean‐square) roughness using the software of the AFM and analysed as a function of the energy of the bombarded ions. Atomic force micrographs showing various types of topography for some specific ion energies are presented. For each ion species there is a critical energy for which the surface roughness attains a maximum value.