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Differential Charging in XPS. Part II: Sample Mounting and X‐ray Flux Effects on Heterogeneous Samples
Author(s) -
Tielsch Brian J.,
Fulghum Julia E.,
Surman David J.
Publication year - 1996
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199607)24:7<459::aid-sia139>3.0.co;2-5
Subject(s) - x ray photoelectron spectroscopy , analytical chemistry (journal) , flux (metallurgy) , x ray , oxide , indium tin oxide , photoelectric effect , indium , sample (material) , materials science , chemistry , nuclear magnetic resonance , optics , thin film , nanotechnology , physics , optoelectronics , chromatography , metallurgy
Factors which affect photoelectron peak positions on heterogeneous samples are evaluated using patterned indium tin oxide (ITO) on glass. Local sample environment, sample mounting and spatial variation in x‐ray flux are all shown to contribute to differential charging effects if no charge neutralization is used. X‐ray photoelectron spectroscopy data acquisition using both Mg Kα and monochromatic Al Kα x‐ray sources shows that confusing and potentially misleading results can be obtained if samples are mounted such that only part of the surface is grounded to the spectrometer. In this case, multiple photoelectron peaks were observed for each photoelectron line of each element in the sample. However, more significant differential charging artifacts were observed from the insulating glass than from the ITO. The proximal causes of the photoelectron peak shifts were evaluated using imaging XPS in conjunction with small‐area spectroscopy.