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Advantages of a High‐frequency Square Wave in a Sputtered Neutral Mass Spectrometry Study of Insulating Materials
Author(s) -
Dang T. A.,
Frisk T. A.,
Nesbella J. K.
Publication year - 1996
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/(sici)1096-9918(199602)24:2<86::aid-sia68>3.0.co;2-r
Subject(s) - sputtering , ion , mass spectrometry , resolution (logic) , analytical chemistry (journal) , atomic physics , chemistry , square wave , phase (matter) , square (algebra) , voltage , materials science , thin film , physics , nanotechnology , geometry , mathematics , organic chemistry , chromatography , quantum mechanics , artificial intelligence , computer science
The direct bombardment mode (plasma sputtering) of d.c.‐voltage sputtered neutral mass spectrometry (SNMS) achieves better depth profile resolution than ion gun sputtering by minimizing the conic structures and preferential sputtering associated with ion gun sputtering. However, when applied to insulating materials, d.c. SNMS allows a charge to build up on the surface; this charging causes sample decomposition and degrades the depth resolution. This problem can be eliminated by applying a high‐frequency square‐wave voltage to the target. The negative phase of the square wave produces positive ion bombardment, while the positive phase attracts electrons to the sample surface to neutralize the accumulated positive charge. The analysis of insulators is particularly enhanced by this method. * Author to whom correspondence should be addressed.