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Modulating Binding Strength and Acidity of Benzene‐Derivative Ligands Enables Efficient and Hysteresis‐Free Perovskite/Silicon Tandem Solar Cells
Author(s) -
Yang Liu,
Wang Shibo,
Ma Ninggui,
Shi Wei,
Fang Zheng,
Jin Yongbin,
Hou Enlong,
Xu Peng,
Cao Fengxian,
Li Wenhao,
Gao Kun,
Li Yao,
Cao Dinxin,
Yang Shaofei,
Yu Cao,
Xie Liqiang,
Yang Xinbo,
Wei Zhanhua
Publication year - 2025
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.202500350
Subject(s) - perovskite (structure) , adsorption , tandem , materials science , band gap , silicon , hysteresis , binding energy , chemical engineering , passivation , chemistry , inorganic chemistry , crystallography , optoelectronics , nanotechnology , layer (electronics) , composite material , physics , engineering , quantum mechanics , nuclear physics
Abstract Passivating defects at the wide‐bandgap perovskite/C 60 interface without impeding interfacial charge transport can effectively enhance the efficiency of perovskite/silicon tandem solar cells (TSCs). Herein, we study the impact of benzene‐derivative ligands with elaborately modulated binding strength and acidity on wide‐bandgap perovskites for high‐performance perovskite/silicon TSCs. Specifically, the acidity/alkalinity and binding strength are preliminarily tuned using different functional groups of ‐PO₃H₂, ‐COOH, and ‐NH₂, and further finely adjusted by altering the chain lengths between the benzene ring and the functional groups. The results show that strong binding is indispensable for effectively suppressing voltage loss. However, the commonly used benzylphosphonic acid (BPPA) for firm surface binding exhibits too strong acidity that can etch the perovskite surface, resulting in halide‐vacancy defects and pronounced hysteresis. Increasing the side chain length of BPPA to (2‐phenylethyl)phosphonic acid not only enables a suitable acid dissociation constant (p K a) to avoid acid‐induced etching but also achieves robust anchoring to the perovskite surface with a parallel adsorption orientation, which reduces the charge transport barrier at the interface. These properties enable strong‐adsorption surface termination (SAST) of the perovskite surface while preventing acid‐induced etching. As a result, the SAST strategy achieves a remarkable efficiency of 32.13% (certified 31.72%) for hysteresis‐free perovskite/silicon TSCs.
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