Open AccessDevice pattern impact on optical endpoint detection by interferometry for STI CMP
Author(s) -
Sophia Bourzgui,
Agnès Roussy,
Jakey Blue,
Gaëlle Georges,
Emilie Faivre,
Karen Labory
Publication year - 2017
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - chemical mechanical planarization , trench , interferometry , polishing , materials science , optics , signal (programming language) , wafer , stack (abstract data type) , shallow trench isolation , diffraction , computer science , optoelectronics , layer (electronics) , physics , nanotechnology , composite material , programming language