z-logo
open-access-imgOpen Access
Cryoetching processes applied to ULK material
Author(s) -
Floriane Leroy,
Thomas Tillocher,
Philippe Lefaucheux,
Rémi Dussart,
Koichi Yatsuda,
Kaoru Maekawa,
Christian Dussarrat,
JeanFrançois de Marneffe,
Mikhaı̈l R. Baklanov
Publication year - 2015
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - Uncategorized
Resource type - Conference proceedings
Subject(s) - materials science , computer science

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom