z-logo
open-access-imgOpen Access
Deep reactive ion etching process for PZT actuators
Author(s) -
Djaffar Belharet,
Vincent Chalvet,
Cédric Clévy,
Micky Rakotondrabe,
Laurent Robert
Publication year - 2015
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - Uncategorized
Resource type - Conference proceedings
Subject(s) - reactive ion etching , materials science , etching (microfabrication) , actuator , deep reactive ion etching , process (computing) , optoelectronics , ion , computer science , nanotechnology , artificial intelligence , chemistry , organic chemistry , layer (electronics) , operating system

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom