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Optimization of nanopores generated by chemical etching of swift-ion irradiated LiNbO3.
Author(s) -
M. Crespillo,
M. Otto,
A. Muñoz-Martín,
J. Olivares,
F. Agulló-López,
M. Seibt,
Matthieu Toulemonde,
C. Trautmann
Publication year - 2008
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - irradiation , etching (microfabrication) , swift , materials science , isotropic etching , ion , nanopore , swift heavy ion , reactive ion etching , optoelectronics , nanotechnology , computer science , chemistry , physics , nuclear physics , organic chemistry , fluence , layer (electronics) , programming language

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