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Effect of the plasma etching on InAsP/InP quantum well structures measured through low temperature micro-photoluminescence and cathodoluminescence
Author(s) -
Jean-Pierre Landesman,
Nebile Işık Göktaş,
Ray LaPierre,
Shahram Ghanad-Tavakoli,
E. Pargon,
Camille PetitEtienne,
Christophe Levallois,
José María Jiménez,
Shabnam Dadgostar
Publication year - 2020
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - cathodoluminescence , photoluminescence , etching (microfabrication) , materials science , optoelectronics , plasma , quantum well , plasma etching , quantum dot , optics , nanotechnology , luminescence , laser , physics , layer (electronics) , quantum mechanics

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