z-logo
open-access-imgOpen Access
An atomistic insight into interface formation in directly integrated materials: a modeling study of CuO deposition on Al(111) through DFT-kMC approach
Author(s) -
Mathilde Guiltat,
Anne Hémeryck
Publication year - 2016
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - deposition (geology) , materials science , interface (matter) , chemical physics , nanotechnology , optoelectronics , computer science , engineering physics , chemistry , physics , composite material , geology , paleontology , sediment , capillary number , capillary action

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom