z-logo
open-access-imgOpen Access
Investigation of electrical activity at the AlN/Si interface using scanning capacitance microscopy and scanning spreading resistance microscopy
Author(s) -
Micka Bah,
Damien Valente,
Marie Lesecq,
N. Defrance,
Maxime Garcia Barros,
Jean-Claude de Jaeger,
Éric Frayssinet,
Rémi Comyn,
Thi Huong Ngo,
Daniel Alquier
Publication year - 2021
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - materials science , spreading resistance profiling , scanning electron microscope , scanning capacitance microscopy , optoelectronics , metalorganic vapour phase epitaxy , microscopy , dopant , optical microscope , capacitance , substrate (aquarium) , analytical chemistry (journal) , diffusion , silicon , secondary ion mass spectrometry , epitaxy , doping , nanotechnology , composite material , optics , layer (electronics) , ion , electrode , scanning confocal electron microscopy , chemistry , physics , oceanography , chromatography , thermodynamics , organic chemistry , geology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom