z-logo
open-access-imgOpen Access
LP MOCVD growth optimisation of InAlN/GaN heterostructures on sapphire and SiC subsrates for HEMT application M-A di
Author(s) -
Forte Poisson,
N. Sarazin,
M. Magis,
M. Tordjman,
J. Di Persio,
E. Morvan,
Farid Medjdoub
Publication year - 2007
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - metalorganic vapour phase epitaxy , high electron mobility transistor , sapphire , optoelectronics , materials science , heterojunction , wide bandgap semiconductor , gallium nitride , epitaxy , transistor , nanotechnology , electrical engineering , optics , laser , physics , layer (electronics) , voltage , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom