Open AccessAtomistic Modeling of Boron Activation and Diffusion in Strained SiGe
Author(s) -
Scott T. Dunham,
Juhyun Song,
Chi Won Ahn
Publication year - 2005
Publication title -
hal (le centre pour la communication scientifique directe)
Language(s) - English
Resource type - Conference proceedings
Subject(s) - boron , materials science , diffusion , optoelectronics , silicon germanium , silicon , engineering physics , electronic engineering , physics , engineering , thermodynamics , nuclear physics