Open AccessUnderstanding the Growth Kinetics of Graphene on Cu and Fe2O3 Using Inductively-Coupled Plasma Chemical Vapor Deposition
Author(s) -
Lam Van Nang,
Dong-Ok Kim,
Tran Nam Trung,
Vinaya Kumar Arepalli,
EuiTae Kim
Publication year - 2017
Publication title -
han-guk hyeonmigyeong hakoeji/applied microscopy
Language(s) - English
Resource type - Journals
eISSN - 2287-4445
pISSN - 2234-6198
DOI - 10.9729/am.2017.47.1.13
Subject(s) - graphene , chemical vapor deposition , inductively coupled plasma , materials science , plasma , layer (electronics) , deposition (geology) , foil method , kinetics , chemical engineering , analytical chemistry (journal) , nanotechnology , chemistry , composite material , paleontology , physics , chromatography , quantum mechanics , sediment , engineering , biology
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