Open AccessCharacterization of Thin Film Passivation for OLED by PECVD
Author(s) -
Kwan-Do Kim,
SeokHee Jang,
Jongmin Kim,
Sang-Mok Chang
Publication year - 2012
Publication title -
korean chemical engineering research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.168
H-Index - 9
eISSN - 2233-9558
pISSN - 0304-128X
DOI - 10.9713/kcer.2012.50.3.574
Subject(s) - passivation , oled , plasma enhanced chemical vapor deposition , materials science , thin film , optoelectronics , layer (electronics) , nanotechnology
OLED . OLED . (flexible) . OLED . (passivation) PECVD OLED . in-situ WVTR (Water Vapor Transmission Rate) 1×10-2 g/m2·day .
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