Open AccessRecent Progress in X-ray Topography for Silicon Materials
Author(s) -
Seiji Kawado
Publication year - 1999
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.38s1.520
Subject(s) - silicon , materials science , synchrotron , x ray , impurity , reflection (computer programming) , diffraction , dislocation , crystallography , octahedron , lattice (music) , crystallographic defect , condensed matter physics , optics , crystal structure , chemistry , physics , optoelectronics , composite material , organic chemistry , computer science , acoustics , programming language
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