Open AccessInterfacial Reaction in a-Si/Au and a-Si/Cu Thin Film Bilayers
Author(s) -
Steve M. Heald,
Zhengquan Tan
Publication year - 1993
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.32s2.386
Subject(s) - silicide , materials science , annealing (glass) , thin film , crystallite , argon , silicon , metal , analytical chemistry (journal) , crystallography , chemistry , metallurgy , nanotechnology , organic chemistry , chromatography
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