Open AccessEpitaxial Deposition of Niobium Nitride by Sputtering
Author(s) -
S. Kosaka,
Yutaka Onodera
Publication year - 1974
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.2s1.613
Subject(s) - sputtering , epitaxy , niobium nitride , niobium , substrate (aquarium) , materials science , nitride , argon , single crystal , crystal (programming language) , cathode , analytical chemistry (journal) , deposition (geology) , thin film , crystallography , chemistry , metallurgy , nanotechnology , layer (electronics) , paleontology , oceanography , organic chemistry , chromatography , sediment , geology , computer science , programming language , biology
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