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Investigation of the Kapitza Anomaly by Frequency-Resolved Phonon Transport in Silicon Wafers
Author(s) -
Wolfgang Klar,
K. Laßmann
Publication year - 1987
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.26s3.369
Subject(s) - phonon , surface phonon , wafer , materials science , phase (matter) , signal (programming language) , condensed matter physics , modulation (music) , optics , chemistry , physics , optoelectronics , computer science , acoustics , programming language , organic chemistry
The threshold at 85 GHz for anomalously large transmission of phonons into LHe has been investigated with Si-wafers for various surface treatments and coverages by phonon spectroscopy. With this multiple boundary scattering geometry we observe an increased sensitivity to spectral features. Connected with the threshold there is a phase shift of the signal compatible with a loss of the slower diffuse portion of the phonon signal to the covering liquid helium. This phase shift depends nonlinearly on modulation frequency between 5 kHz and 200 kHz (modulation of the generator to sort out the monochromatic phonons) and in a characteristic manner on the surface treatment. The finite phase shift at 5 kHz is indicative of very long lived 85 GHz phonons up into the 100 µs is range inspite of the multiple Si-LHe-interface scattering involved. Minor differences in polishing quality show up clearly in the phase shift at low modulation frequencies.

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