Open Access(Invited) Fine Focused Ion Beams
Author(s) -
R. L. Seliger,
R. L. Kubena,
V. Wang
Publication year - 1982
Publication title -
japanese journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.21s1.3
Subject(s) - materials science , ion implantation , ion beam , wafer , semiconductor , silicon , ion beam deposition , microfabrication , focused ion beam , optoelectronics , dopant , boron , ion source , fabrication , ion , beam (structure) , optics , chemistry , doping , physics , medicine , alternative medicine , organic chemistry , pathology
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