Open AccessHigh Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering Technique
Author(s) -
Tomonobu Hata,
Fumio Takeda,
Osamu Morimoto,
Etsuji Noda,
Toshio Hada
Publication year - 1981
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.20s3.145
Subject(s) - materials science , sputter deposition , substrate (aquarium) , deposition (geology) , piezoelectricity , cavity magnetron , sputtering , optoelectronics , electrode , metal , thin film , composite material , nanotechnology , metallurgy , paleontology , oceanography , chemistry , sediment , geology , biology
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