High Resolution Fabrication of Submicron Structures by Ion Beam Lithography | Zendy

Kazuyuki Moriwaki | Zendy; Hiroaki Aritome | Zendy; Susumu Namba | Zendy

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High Resolution Fabrication of Submicron Structures by Ion Beam Lithography

Author(s) -

Kazuyuki Moriwaki,

Hiroaki Aritome,

Susumu Namba

Publication year - 1981

Publication title -

japanese journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.487

H-Index - 129

eISSN - 1347-4065

pISSN - 0021-4922

DOI - 10.7567/jjaps.20s1.69

Subject(s) - resist , electron beam lithography , lithography , fabrication , ion beam lithography , x ray lithography , materials science , next generation lithography , stencil lithography , ion beam , substrate (aquarium) , focused ion beam , resolution (logic) , optoelectronics , optics , maskless lithography , beam (structure) , nanotechnology , ion , chemistry , physics , layer (electronics) , alternative medicine , artificial intelligence , oceanography , pathology , computer science , medicine , organic chemistry , geology

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