Open AccessSelective Plasma Oxidation of GaAs –A Study of the Interface Properties
Author(s) -
Robert P. H. Chang
Publication year - 1980
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.19s1.483
Subject(s) - oxide , plasma , oxygen , analytical chemistry (journal) , chemistry , spectroscopy , materials science , chemical engineering , environmental chemistry , metallurgy , physics , organic chemistry , quantum mechanics , engineering
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